@Article{UedaReutLepi:2005:CoNiIo,
               author = "Ueda, Mario and Reuther, H and Lepienski, C. M.",
          affiliation = "Instituto Nacional de Pesquisas Espaciais, Laborat{\'o}rio 
                         Associado de Plasmas, (INPE, LAP)",
                title = "Comparison of nitrogen ion beam and plasma immersion implantation 
                         in Al5052 alloy",
              journal = "Nuclear Instruments and Methods in Physics Research Section B: 
                         Beam Interactions with Materials and Atoms",
                 year = "2005",
               volume = "240",
                pages = "199–203",
             keywords = "Nitrogen ion implantation, Al5052 alloy, Ion beam, Plasma 
                         immersion ion implantation.",
             abstract = "Experiments comparing nitrogen ion implantations in Al5052 by beam 
                         and plasma immersion were carried out. Beam implantation (BI) was 
                         carried out using a 100 keV, high current beam implanter while the 
                         plasma immersion ion implantation (PIII) was obtained using a glow 
                         discharge plasma source coupled to a pulsed high voltage supply. A 
                         nitrogen BI dose of 5 · 1017 cm2 at 100 keV was attained with near 
                         Gaussian implantation profile while the PIII was performed until 
                         we reached similar doses with a maximum energy of 15 keV. 
                         Implantation profiles were obtained by Auger electron spectroscopy 
                         (AES). X-ray diffraction (XRD) indicated the formation of AlN in 
                         both cases but it was more clearly demonstrated by high resolution 
                         AES. For BI treatment, a buried AlN layer was achieved while for 
                         PIII, a layer of AlNxOy close to the surface was seen. Due to the 
                         high temperature reached in the PIII processing (400 C), a 
                         softening of the Al5052 bulkresulted while for BI processed 
                         samples with <200 C an increase in hardness was observed.",
                  doi = "10.1016/j.nimb.2005.06.115",
                  url = "http://dx.doi.org/10.1016/j.nimb.2005.06.115",
                 issn = "0168-583X and 0167-5087",
             language = "en",
           targetfile = "1-s2.0-S0168583X05010682-main.pdf",
        urlaccessdate = "28 abr. 2024"
}